focused ion beam

См. также в других словарях:

• Focused ion beam — Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor and materials science fields for site specific analysis, deposition, and ablation of materials. The FIB is a scientific instrument that resembles a… …   Wikipedia

• Focused Ion Beam — Foto eines FIB Arbeitsplatzes Ein Focused Ion Beam (Abk.: FIB; englisch für „fokussierter Ionenstrahl“, deutsch auch Ionenfeinstrahlanlage) ist ein Gerät zur Oberflächenanalyse und bearbeitung. Steht der Materialabtrag im Vordergrund, heißt das… …   Deutsch Wikipedia

• Focused-Ion-Beam-Mikroskop — Foto eines FIB Arbeitsplatzes Ein Focused Ion Beam (Abk.: FIB; englisch für „fokussierter Ionenstrahl“) ist ein Gerät zur Oberflächenanalyse und bearbeitung. Steht der Materialabtrag im Vordergrund, heißt das Verfahren auch Ionendünnung. Wenn die …   Deutsch Wikipedia

• focused ion-beam lithography — fokusuojamoji jonpluoštė litografija statusas T sritis radioelektronika atitikmenys: angl. focused ion beam lithography vok. Lithografie mittels fokussierter Ionenstrahlen, f rus. литография с фокусируемым ионным пучком, f pranc. lithographie par …   Radioelektronikos terminų žodynas

• Ion-beam sculpting — Ion Beam scultping is a term used to describe a two step process to make solid state nanopores. The term itself was coined by Golovchenko and co workers at Harvard in the paper Ion beam sculpting at nanometer length scales [J. Li, D. Stein, C.… …   Wikipedia

• Ion beam — An ion beam is a type of particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. Today s ion beam sources are typically derived from the mercury vapor thrusters… …   Wikipedia

• Ion beam lithography — By analogy to E beam lithography, focused ion beam lithography scans an ion beam across a surface to form a pattern. The ion beam may be used for directly sputtering the surface, or may induce chemical reactions in the exposed top layer (resist) …   Wikipedia

• Ion beam deposition — (IBD) is a process of applying materials to a target through the application of an ion beam.In an ion source source materials gases or evaporated solids are ionized using electron ionization or by application of high electric fields (Penning ion… …   Wikipedia

• Gas cluster ion beam — Gas Cluster Ion Beams (GCIB) is a new technology for nano scale modification of surfaces. It can smooth a wide variety of surface material types to within an angstrom of roughness without subsurface damage. It is also used to chemically alter… …   Wikipedia

• Ion thruster — An ion thruster is a form of electric propulsion used for spacecraft propulsion that creates thrust by accelerating ions. Ion thrusters are characterized by how they accelerate the ions, using either electrostatic or electromagnetic force.… …   Wikipedia

• Electron beam induced deposition — (EBID) is a process of decomposing gaseous molecules by electron beam leading to deposition of non volatile fragments onto a nearby substrate. Process Focused electron beam of scanning electron microscope (SEM) or scanning transmission electron… …   Wikipedia